A powerful soft X-ray source for X-ray lithography based on plasma focusing

Physica Scripta

Volumn 57, Issue 4, 1998, Pages 488-494

  Bogolyubov, E P ^e   Bochkov, V D ^c   Veretennikov, V A ^a   Vekhoreva, L T ^d   Gribkov, V A ^a   Dubrovskii, A V ^a   Ivanov, Yu P ^e   Isakov, A I ^a   Krokhin, O N ^a   Lee, P ^b   Lee, S ^b   Nikulin, V Ya ^a   Serban, A ^b   Silin, P V ^a   Feng, X ^b   Zhang, G X ^b  

^a LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c Scientific Production Corporation Plasma   (Russian Federation)

^d PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

^e DUKHOV RESEARCH INSTITUTE OF AUTOMATICS VNIIA   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; IRRADIATION; LIGHT EMISSION; PLASMAS; X RAY LITHOGRAPHY;

PLASMA FOCUSING; SOFT X RAY EMISSION;

X RAY LASERS;

EID: 0032047081     PISSN: 00318949     EISSN: None     Source Type: Journal    
DOI: 10.1088/0031-8949/57/4/003     Document Type: Article

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