SCOPUS 정보 검색 플랫폼

Volumn 30, Issue 9, 1998, Pages 36-XII

Advancements in the production of ultrapure water for ICP-MS metals analysis

(2) Stewart, Byron M a Darbouret, Daniel a

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DISSOCIATION; ENVIRONMENTAL IMPACT; ION EXCHANGE; IONIZATION; IONS; PURIFICATION; RESERVOIRS (WATER); REVERSE OSMOSIS; WATER; WATER QUALITY;

ELECTRODEIONIZATION; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; PRETREATMENT; ULTRAPURE POLISHING SYSTEM;

MASS SPECTROMETRY;

EID: 0032046411 PISSN: 00447749 EISSN: None Source Type: Trade Journal
DOI: None Document Type: Article

Times cited : (8)

References (8)

1
- 11544294444
- Cahners Publishing Co.
- Balaz MK. Semiconductor industry benefits from ICP-MS. Research and development. June ed. Cahners Publishing Co., 1995.
- (1995) Semiconductor Industry Benefits from ICP-MS. Research and Development. June Ed.
- Balaz, M.K.¹

2
- 0003777640
- New York: Marcel Dekker Inc.
- Parekh BS. Reverse osmosis technology. Applications for high-purity water production. New York: Marcel Dekker Inc., 1988:23-42.
- (1988) Reverse Osmosis Technology. Applications for High-purity Water Production , pp. 23-42
- Parekh, B.S.¹

3
- 11544346977
- May/June. Tall Oaks Publishing, Inc.
- Malhotra S, Chan O, Chu T, Fucsko A. Semiconductors: correlation of boron breakthrough versus resistivity and dissolved silica in RO/DI system. Ultrapure water. May/June. Tall Oaks Publishing, Inc., 1996.
- (1996) Semiconductors: Correlation of Boron Breakthrough Versus Resistivity and Dissolved Silica in RO/DI System. Ultrapure Water
- Malhotra, S.¹ Chan, O.² Chu, T.³ Fucsko, A.⁴

4
- 11544360377
- Internal technical review. July. Bedford, MA: Millipore Corp.
- Rejection of silica by Milli-RX™ systems. The bridge. Vol. 8. Internal technical review. July. Bedford, MA: Millipore Corp., 1995.
- (1995) The Bridge , vol.8

5
- 0003458260
- Lexington, MA: D.C. Heath and Co.
- Nebergall WH, Holtzclaw HF, Robins WR. College chemistry with qualitative analysis. 6th ed. Lexington, MA: D.C. Heath and Co., 1980:424.
- (1980) College Chemistry with Qualitative Analysis. 6th Ed. , pp. 424
- Nebergall, W.H.¹ Holtzclaw, H.F.² Robins, W.R.³

6
- 11544318488
- Technical brief TB120. Aug. Bedford, MA: Millipore Corp.
- Selection and control of purification media: the key to ultrapure water production in the laboratory. Technical brief TB120. Aug. Bedford, MA: Millipore Corp., 1997.
- (1997) Selection and Control of Purification Media: The Key to Ultrapure Water Production in the Laboratory

7
- 0005486992
- The effect of temperature, temperature error, and impurities on compensated resistivity measurements
- Reprint from work presented. Santa Clara, CA. Courtesy of Thorton Associates, March
- Bevilacqua AC. The effect of temperature, temperature error, and impurities on compensated resistivity measurements. Reprint from work presented at 16th Annual Semiconductor Pure Water and Chemicals Conference. Santa Clara, CA. Courtesy of Thorton Associates, March 1997, 1-8.
- (1997) 16th Annual Semiconductor Pure Water and Chemicals Conference , pp. 1-8
- Bevilacqua, A.C.¹

8
- 0031210814
- A benchtop inductively coupled plasma mass spectrometer
- Aug. Wilmington, DE: Hewlett-Packard Co.
- Kishi Y. A benchtop inductively coupled plasma mass spectrometer. Hewlett-Packard journal. Aug. Wilmington, DE: Hewlett-Packard Co., 1997:3-6.
- (1997) Hewlett-Packard Journal , pp. 3-6
- Kishi, Y.¹

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