A study of the response rate to nitrogen dioxide exposure in metal phthalocyanine thin film sensors

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 436-439

  Zhou, Q ^a   Gould, R D ^a  

^a KEELE UNIVERSITY   (United Kingdom)

Author keywords

Gas sensors; Nitrogen dioxide; Thin films

Indexed keywords

COPPER COMPOUNDS; IONS; MATHEMATICAL MODELS; MOLECULES; NITROGEN COMPOUNDS; SATURATION (MATERIALS COMPOSITION); THIN FILMS;

COPPER PHTHALOCYANINE; ELECTRICAL SIGNAL; ELOVICH EQUATION; IRON PHTHALOCYANINE; NITROGEN DIOXIDE; NITROGEN DIOXIDE CONCENTRATION; RESPONSE RATE;

CHEMICAL SENSORS;

EID: 0032045579     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00580-4     Document Type: Article

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