Fabrication of ferroelectric-domain-inverted gratings in LiNbO3 by applying voltage using etched-Si stamper electrode

Electronics Letters

Volumn 34, Issue 9, 1998, Pages 880-881

  Kintaka, K ^a,b   Fujimura, M ^a   Suhara, T ^a   Nishihara, H ^a  

^a OSAKA UNIVERSITY   (Japan)

^b OSAKA NATIONAL RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTEGRATED OPTICS; LITHIUM COMPOUNDS; SECOND HARMONIC GENERATION; SEMICONDUCTING SILICON;

ETCHED SILICON STAMPER ELECTRODES; LITHIUM NIOBATE;

DIFFRACTION GRATINGS;

EID: 0032045252     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19980645     Document Type: Article

References (10)

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