Simulation of selective tungsten chemical vapour deposition

Materials Science in Semiconductor Processing

Volumn 1, Issue 1, 1998, Pages 43-54

  Kuijlaars, K J ^a,b   Kleijn, C R ^a   Van Den Akker, H E A ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Shell CAPSA Refineria   (Argentina)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHEMISTRY; HYDRODYNAMICS; NUCLEATION; OXIDES; PRESSURE EFFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACES; TUNGSTEN;

SELECTIVE TUNGSTEN CHEMICAL VAPOUR DEPOSITION; SELECTIVITY LOSS;

MATHEMATICAL MODELS;

EID: 0032035989     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(98)00004-3     Document Type: Article

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