Spatially resolved optical emission study of sputtering in reactive plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 2, 1998, Pages 514-523

  Moshkalyov, S A ^a   Machida, M ^a   Campos, D O ^a   Dulkin, A ^b  

^a UNIVERSITY OF CAMPINAS   (Brazil)

^b NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ION BOMBARDMENT; LIGHT EMISSION; MOLECULES; PHOTONS; PLASMAS; REACTIVE ION ETCHING; SPUTTERING;

PHOTON EMISSION; REACTIVE PLASMAS;

EMISSION SPECTROSCOPY;

EID: 0032028563     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581070     Document Type: Article

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