High yield production of C74 using an arc-discharge plasma

Thin Solid Films

Volumn 316, Issue 1-2, 1998, Pages 51-55

  Hatakeyama, R ^a   Hirata, T ^a   Ishida, H ^a   Hayashi, T ^a   Sato, N ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Arc discharge plasma; Fullerene C74; High yield production

Indexed keywords

HELIUM; LASER APPLICATIONS; MASS SPECTROMETRY; PLASMA APPLICATIONS; PRESSURE EFFECTS; SOOT;

ARC DISCHARGE PLASMAS;

FULLERENES;

EID: 0032028345     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00387-3     Document Type: Article

References (14)

1. W. Krätschmer, L.D. Lamb, K. Fostiropoulos, D.R. Huffman, Nature 347 (1990) 354.
2. F. Diederich, R. Ettl, Y. Rubin, et al., Science 252 (1991) 548.
3. K. Kikuchi, N. Nakahara, T. Wakabayashi, et al., Chem. Phys. Lett. 188 (1992) 177.
4. Y. Achiba, K. Kikuchi, Y. Aihara, T. Wakabayashi, Y. Miyake, M. Kainosho, Mat. Res. Soc. Symp. Proc. 359 (1995) 3.
5. Y. Chai, T. Guo, C. Jin, et al., J. Phys. Chem. 95 (1991) 7564.
6. H. Shinohara, H. Sato, M. Ohkohchi, et al., Nature 357 (1992) 52.
7. G. Ulmer, E.E.B. Campbell, R. Kühnle, H.-G. Busmann, I.V. Hertel, Chem. Phys. Lett. 182 (1991) 114.
8. Y. Saito, M. Inagaki, H. Shinohara, H. Nagashima, M. Ohkohchi, Y. Ando, Chem. Phys. Lett. 200 (1992) 643.
9. Y. Achiba, T. Wakabayashi, T. Moriwaki, S. Suzuki, H. Shiromaru, Mat. Sci. Eng. B 19 (1993) 14.
10. R.E. Haufler, J. Conceicao, L.P.F. Chibante, et al., J. Phys. Chem. 94 (1990) 8634.
11. R.E. Haufler, Y. Chai, L.P.F. Chibante, et al., Mat. Res. Soc. Symp. Proc. 206 (1990) 627.
12. P.W. Fowler, D.E. Manolopoulos, Nature 355 (1992) 428.
13. Y. Kubozono, H. Maeda, Y. Takabayashi, et al., J. Am. Chem. Soc. 118 (1996) 6998.
14. H.-J. Muhr, R. Nesper, B. Schnyder, R. Kötz, Chem. Phys. Lett. 249 (1996) 399.