Depth profiling of phosphorus in photonic-grade silicon using laser-induced breakdown spectrometry

Applied Spectroscopy

Volumn 52, Issue 3, 1998, Pages 444-448

  Milan M ^a   Lucena, P ^a   Cabalin L M ^a   Laserna, J J ^a  

^a UNIVERSITY OF MÁLAGA   (Spain)

Author keywords

Depth profiling; Laser induced breakdown spectrometry; LIBS; Phosphorus distribution analysis; Silicon wafers

Indexed keywords

CHARGE COUPLED DEVICES; DIFFUSION IN SOLIDS; EMISSION SPECTROSCOPY; LASER ABLATION; LASER DIAGNOSTICS; LASER PRODUCED PLASMAS; NEODYMIUM LASERS; PHOSPHORUS; SEMICONDUCTOR DOPING;

DEPTH PROFILING; LASER INDUCED BREAKDOWN SPECTROSCOPY (LIBS); PHOTONIC-GRADE SILICON;

SILICON WAFERS;

EID: 0032026938     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702981943662     Document Type: Article

References (30)

1. M. A. Green, Semicond. Sci. Technol. 8, 1 (1993).
2. Solar Cells: Operating Principles, Technology and System Application, M. A. Green, Ed. (Prentice-Hall, Englewood Cliffs, New Jersey, 1982).
3. A. S. Grove, Physics and Technology of Semiconductor Devices (John Wiley, New York, 1967), p. 158.
4. A. Ourmazd and W. Schröter, Appl. Phys. Lett. 45, 781 (1984).
5. E. M. Filangeri and T. Nishida, J. Appl. Phys. 75, 7931 (1994).
6. P. K. Chu, W. C. Harris, Jr., and G. H. Morrison, Anal. Chem. 54, 2208 (1982).
7. M. Anderle and C. M. Loxton, Nucl. Instr. and Meth. 15B, 186 (1986).
8. K. Wittmaack, Vacuum 34, 119 (1983).
9. V. Majidi and M. R. Joseph, Crit. Rev. Anal. Chem. 23, 143 (1992).
10. Z. W. Hwang, Y. Y. Teng, K. P Li, and J. Sneddon, Appl. Spectrosc. 45, 435 (1991).
11. Y. I. Lee, S. P. Sawan, T. L. Thiem, Y. Y. Teng, and J. Sneddon, Appl. Spectrosc. 46, 436 (1992).
12. L. J. Radziemski and D. A. Cremers, "Spectrochemical Analysis Using Laser Plasma Excitation", in Laser-Induced Plasmas and Applications, L. J. Radziemski and D. A. Cremers, Eds. (Marcel Dekker, New York, 1989), Chap. 7, p. 295.
13. D. A. Cremers, Appl. Spectrosc. 41, 572 (1987).
14. A. Quentmeier, W. Sdorra, and K. Niemax, Spectrochim. Acta 45B, 537 (1990).
15. J. R. Wachter and D. A. Cremers, Appl. Spectrosc. 41, 1042 (1987).
16. J. B. Morris, B. E. Forch, and A. W. Miziolek, Appl. Spectrosc. 44, 1040 (1990).
17. K. C. Ng, N. L. Ayala, J. B. Simeonsson, and J. D. Winefordner, Anal. Chim. Acta 269, 123 (1992).
18. R. J. Nordstrom, Appl. Spectrosc. 49, 1490 (1995).
19. H. Zhang, J. P. Singh, F. Y. Yueh, and R. L. Cook, Appl. Spectrosc. 49, 1617 (1995).
20. D. R. Anderson, C. W. McLeod, T. English, and A. T. Smith, Appl. Spectrosc. 49, 691 (1995).
21. C. J. Lorenzen, C. Carlhoff, U. Hahn, and M. Jogwich, J. Anal. At. Spectrom. 7, 1029 (1992).
22. M. Hidalgo, F. Martin, and J. J. Laserna, Anal. Chem. 68, 1095 (1996).
23. M. Milan, J. M. Vadillo, and J. J. Laserna, J. Anal. At. Spectrom. 12, 441 (1997).
24. Wavelengths and Transition Probabilities for Atoms and Atomic Ions, Part I, Wavelengths, J. Reader and C. H. Corliss, Eds. (National Bureau of Standards, Washington, D.C., 1980).
25. Y. Iida, Appl. Spectrosc. 43, 229 (1989).
26. G. J. Beenen and E. H. Piepmeier, Appl. Spectrosc. 38, 851 (1984).
27. M. Autin, A. Briand, P. Mauchien, and J. M. Mermet, Spectrochim. Acta 48B, 851 (1993).
28. F. Leis, W. Sdorra, J. B. Ko, and K. Niemax, Mikrochim. Acta 2, 185 (1989).
29. K. J. Grant, G. L. Paul, and J. O'Neill, Appl. Spectrosc. 45, 701 (1991).
30. C. Geertsen, A. Briand, F. Chartier, J. L. Lacour, P. Mauchien, S. Sjöström, and J. M. Mermet, J. Anal. At. Spectrom. 9, 17 (1994).