Structural analysis of porous silicon multilayer using X-ray diffraction

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 3 A, 1998, Pages 998-1005

  Maehama, Takehiro ^a   Afuso, Chushin ^a   Itoh, Nobuo ^b  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Porous silicon; X ray double crystal method; X ray topography

Indexed keywords

ANODIC OXIDATION; CRYSTAL LATTICES; CURRENT DENSITY; X RAY DIFFRACTION ANALYSIS;

X RAY CROSS SECTIONAL TOPOGRAPHIC TECHNIQUE;

POROUS SILICON;

EID: 0032025094     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.998     Document Type: Article

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