Characteristics of Pb(Zr0.53Ti0.47)O3 films deposited by metalorganic decomposition on Pt/Ti/TiO2/polysilicon/Si3N4/Si for pizoelectric microelectromechanical system devices

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 3 A, 1998, Pages 948-950

  Kim, Joon Ran ^a   Yoon, Young Soo ^a,b   Polla, Dennis L ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Heat treatment; MEMS; Piezoelectric constant; PZT; Si3N4

Indexed keywords

ANNEALING; ETCHING; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTROMECHANICAL DEVICES; PERMITTIVITY MEASUREMENT; POLYCRYSTALLINE MATERIALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FILM CROSS SECTIONAL IMAGES;

METALLIC FILMS;

EID: 0032024984     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.948     Document Type: Article

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