He metastable concentration measurements in a glow discharge

Chemical Physics

Volumn 228, Issue 1-3, 1998, Pages 145-156

  Suh, Myeong H ^a   Hong, Xichun ^a   Miller, Terry A ^a  

^a OHIO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032023966     PISSN: 03010104     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0301-0104(97)00364-9     Document Type: Article

References (15)

1. X. Hong, T.A. Miller, Chem. Phys. xx (1998) xxx.
2. VLSI Technology, McGraw-Hill, New York, 1983.
3. Owrutsky J., Rosenbaum N., Tack L., Saykally R. J. Chem. Phys. 83:1985;5338.
4. D. Butler, C. Stoddart, P. Stuart, in: Aspects of Adhesion, 6th ed., Univ. of London Press, London, 1971.
5. B. Chapman, Glow Discharge Processes, Wiley, New York, 1980.
6. Radunsky M.B., Saykally R.J. Chem. Phys. Lett. 152:1988;419.
7. Hong X., Miller T.A. J. Chem. Phys. 101:1994;4572.
8. Hong X., Miller T.A. Chem. Phys. Lett. 233:1995;298.
9. Hong X., Miller T.A. J. Chem. Phys. 103:1995;8821.
10. Jolly J., Touzeau M. J. Quan. Spectrosc. Radia. Transfer. 15:1975;863.
11. Ichikawa Y., Teji S. J. Phys. D. 13:1979;1243.
12. Kane D., Dunn M. J. Phys. B. 16:1983;2709.
13. A.C.G. Mitchell, M.W. Zemansky, Resonance Radiation and Excited Atoms, The MacMillan Co., New York, 1934.
14. Brown P.G., Dunn M.H. J. Phys. B. 6:1973;1103.
15. Varey R.H., Smally J., Richards R.H., Gozna C., Swift Hook D. J. Phys. D. 4:1971;1520.