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Volumn 72, Issue 13, 1998, Pages 1584-1586
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High-current-density ITOx/NiOx thin-film diodes
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
CARRIER CONCENTRATION;
CERAMIC MATERIALS;
CHARGE CARRIERS;
CURRENT DENSITY;
CURRENT VOLTAGE CHARACTERISTICS;
HETEROJUNCTIONS;
MATHEMATICAL MODELS;
SPUTTER DEPOSITION;
SUBSTRATES;
THIN FILMS;
CAPACITANCE VOLTAGE CHARACTERISTICS;
ELECTROSTATIC DISCHARGE;
THIN FILM DIODES;
SEMICONDUCTOR DIODES;
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EID: 0032023345
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.121122 Document Type: Article |
Times cited : (21)
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References (20)
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