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Volumn 72, Issue 13, 1998, Pages 1584-1586

High-current-density ITOx/NiOx thin-film diodes

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CARRIER CONCENTRATION; CERAMIC MATERIALS; CHARGE CARRIERS; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; HETEROJUNCTIONS; MATHEMATICAL MODELS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

EID: 0032023345     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121122     Document Type: Article
Times cited : (21)

References (20)
  • 7
    • 21544451771 scopus 로고    scopus 로고
    • U.S. Patent No. 5,614,727 (1997)
    • D. Mauri, W. Y. Lee, and C. Hwang, U.S. Patent No. 5,614,727 (1997).
    • Mauri, D.1    Lee, W.Y.2    Hwang, C.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.