Rapid thermal metal organic chemical vapor deposition of ZnTe

Journal of Crystal Growth

Volumn 186, Issue 1-2, 1998, Pages 55-59

  Stolyarova, S ^a   Amir, N ^a   Nemirovsky, Y ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

Epitaxial growth; MOCVD; Rapid thermal processing; ZnTe

Indexed keywords

EPITAXIAL GROWTH; EXCITONS; HEAT TREATMENT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHONONS; PHOTOLUMINESCENCE; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING CADMIUM COMPOUNDS; SUBSTRATES; THICKNESS MEASUREMENT;

FULL WIDTH AT HALF MAXIMUM (FWHM); ZINC TELLURIDE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 0032023140     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00450-8     Document Type: Article

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