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American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Volumn 39, Issue 1, 1998, Pages 85-86

Toward chemically amplified photolithography of conjugated polymers: Acid-sensitive polythiophenes

(4) Holdcroft, Steven a Yu, Jianfei a Abley, Michael a Yang, Cheng a

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC POLYMERS; CONFORMATIONS; MOLECULAR STRUCTURE; ORGANIC ACIDS; PHOTOLITHOGRAPHY; PHOTOLYSIS; PHOTOSENSITIVITY; PLASTIC FILMS; SEMICONDUCTING FILMS; SOLUBILITY; SULFUR COMPOUNDS; THERMAL EFFECTS;

CAMPHORSULFONIC ACID; DEPROTECTION; LASER PHOTOLITHOGRAPHY; POLYTHIOPHENES; TRIFLUOROMETHANE SULFONIC ACID;

SEMICONDUCTING POLYMERS;

EID: 0032022867 PISSN: 00323934 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Article

Times cited : (3)

References (10)

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2
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- (1989) Electronic Properties of Conjugated Polymers III
- Allen, P.C.¹ Bott, D.C.² Brown, C.S.³ Connors, L.M.⁴ Gray, S.⁵ Walker, N.S.⁶ Clemonson, P.I.⁷ Feast, W.J.⁸

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.