Working characteristics of two magnetron sputtering devices based on different unbalanced magnetic systems of type II

Surface and Coatings Technology

Volumn 100-101, Issue 1-3, 1998, Pages 300-304

  Groudeva Zotova, S ^a  

^a INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

Ion assisted deposition; Magnetron sputtering; Surface protection

Indexed keywords

ION BEAMS; MAGNETIC FIELD EFFECTS; PROTECTIVE COATINGS; SPUTTER DEPOSITION; SUBSTRATES;

ION ASSISTED DEPOSITION; MAGNETRON SPUTTERING DEVICES;

MAGNETRON SPUTTERING;

EID: 0032022801     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00637-3     Document Type: Article

References (10)

1. N. Savvides, B. Window, J. Vac. Sci. Technol. A 4 (3) (1986) 504.
2. D. Monaghan, R.D. Arnell, Vacuum 43 (1-2) (1992) 77.
3. B. Window, N. Savvides, J. Vac. Sci. Technol. A 4 (3) (1986) 453.
4. G.A. Clarke, N.R. Osborne, R.R. Parsons, J. Vac. Sci. Technol. A 9 (3) (1991) 1166.
5. S.L. Rohde, W.D. Sproul, J.R. Rohde, J. Vac. Sci. Technol. A 9 (3) (1991) 1178.
6. S. Groudeva-Zotova, In Future Directions in Thin Film Science and Technology, Proc. of the ISSM'96 School, Varna, Bulgaria, World Sci. Publ. Company, Singapore. (1997) p. 556.
7. R.K. Waits, in: J.L. Vossen, W. Kern (Eds.), Thin Film Processes, Academic Press, New York, 1978, p. 131.
8. G. Mohan Rao, S. Mohan, J. Vac. Sci. Technol. A 9 (6) (1991) 3100.
9. G.K. Muralidhar, J. Musil, S. Kadlec, J. Vac. Sci. Technol. A 14 (4) (1996) 2182.
10. B. Window, G.L. Harding, J. Vac. Sci. Technol. A 10 (5) (1992) 3300.