Fabrication of monocrystalline refractory metal nanostructures capable of ballistic electron transport

Nanotechnology

Volumn 9, Issue 1, 1998, Pages 1-5

  Mikhailov, G M ^a   Aparshina, L I ^a   Chernykh, A V ^a   Dubonos, S V ^a   Koval, Yu I ^a   Malikov, I V ^a  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC RESISTANCE; ELECTRON BEAM LITHOGRAPHY; ELECTRON TRANSPORT PROPERTIES; EPITAXIAL GROWTH; ETCHING; MASKS; METALLIC FILMS; REFRACTORY METALS;

BALLISTIC ELECTRON TRANSPORT;

NANOSTRUCTURED MATERIALS;

EID: 0032022214     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/9/1/001     Document Type: Article

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