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Volumn 8, Issue 1, 1998, Pages 39-44
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Passive and fixed alignment of devices using flexible silicon elements formed by selective etching
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL ORIENTATION;
ELECTROCHEMISTRY;
ETCHING;
MICROELECTRONICS;
PASSIVATION;
PHOTOVOLTAIC EFFECTS;
SILICON WAFERS;
SUBSTRATES;
PHOTOVOLTAIC ELECTROCHEMICAL ETCH STOP TECHNIQUE (PHET);
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0032022213
PISSN: 09601317
EISSN: None
Source Type: Journal
DOI: 10.1088/0960-1317/8/1/007 Document Type: Article |
Times cited : (18)
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References (18)
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