![]() |
Volumn 80, Issue 13, 1998, Pages 2873-2876
|
Reexchange controlled diffusion in surfactant-mediated epitaxial growth: Si on as-terminated Si(111)
a a a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
ACTIVATION ENERGY;
ARSENIC;
CHEMICAL BONDS;
DIFFUSION IN SOLIDS;
ELECTRON ENERGY LEVELS;
NANOSTRUCTURED MATERIALS;
PASSIVATION;
REACTION KINETICS;
SEMICONDUCTING SILICON;
SURFACE ACTIVE AGENTS;
ADATOM DIFFUSION BARRIER;
ENERGY GAIN;
EXCHANGE BARRIER;
REEXCHANGE PROCESS;
EPITAXIAL GROWTH;
|
EID: 0032021948
PISSN: 00319007
EISSN: 10797114
Source Type: Journal
DOI: 10.1103/PhysRevLett.80.2873 Document Type: Article |
Times cited : (25)
|
References (17)
|