Synthesis and photoresist property of a polyamide containing a naphthylurea moiety

High Performance Polymers

Volumn 10, Issue 1, 1998, Pages 61-68

  Akimoto, Satoshi ^a   Jikei, Mitsutoshi ^b   Kakimoto, Masa Aki ^b  

^a TOPPAN PRINTING CO LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; CROSSLINKING; PHOTOCHEMICAL REACTIONS; PHOTORESISTS; POLYCONDENSATION; ULTRAVIOLET RADIATION; UREA;

UREA DERIVATIVES;

POLYAMIDES;

EID: 0032021632     PISSN: 09540083     EISSN: None     Source Type: Journal    
DOI: 10.1088/0954-0083/10/1/008     Document Type: Article

References (7)

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6. Nakayama T, Mochizuki A and Ueda M 1996 Reactive Functional Polym. 30 109-15
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