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Volumn 46 B46, Issue 3, 1998, Pages 202-207
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Photochemical sensors based on amorphous silicon thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CHEMICAL VAPOR DEPOSITION;
CURRENT VOLTAGE CHARACTERISTICS;
GAS ABSORPTION;
HYDROGEN;
MIS DEVICES;
PHOTOCHEMICAL REACTIONS;
SEMICONDUCTOR DEVICE STRUCTURES;
SEMICONDUCTOR DIODES;
SEMICONDUCTOR INSULATOR BOUNDARIES;
THERMOOXIDATION;
THIN FILMS;
HYDROGENATED AMORPHOUS SILICON PHOTOCHEMICAL SENSORS;
CHEMICAL SENSORS;
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EID: 0032021479
PISSN: 09254005
EISSN: None
Source Type: Journal
DOI: 10.1016/s0925-4005(98)00112-9 Document Type: Article |
Times cited : (5)
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References (7)
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