Distribution of deep levels in Si:Au by spectral analysis of deep-level transient spectroscopy

Applied Physics A: Materials Science and Processing

Volumn 66, Issue 3, 1998, Pages 323-325

  Yoshino, J ^a   Okamoto, Y ^a   Morimoto, J ^a   Miyakawa, T ^a  

^a NATIONAL DEFENSE ACADEMY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DEEP LEVEL TRANSIENT SPECTROSCOPY; GOLD;

DEEP LEVEL DISTRIBUTION;

SEMICONDUCTING SILICON;

EID: 0032010817     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050673     Document Type: Article

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