Optical deflection setup for stress measurements in thin films

Review of Scientific Instruments

Volumn 69, Issue 1-2, 1998, Pages 460-462

  Bicker, M ^a   Von Hulsen U ^a   Laudahn, U ^a   Pundt, A ^a   Geyer, U ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; LASER BEAMS; LENSES; MECHANICAL VARIABLES MEASUREMENT; OPTICAL BEAM SPLITTERS; PHOTODETECTORS; SEMICONDUCTOR LASERS; SILICON WAFERS; STRESSES; SUBSTRATES; THIN FILMS;

KEITHLEY DIGITAL MULTIMETER SCANNER; LINEAR POSITION SENSITIVE PHOTODETECTORS; PHYSICAL VAPOR DEPOSITION; STRESS MEASUREMENT;

OPTICAL FILMS;

EID: 0032003589     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148721     Document Type: Article

References (10)

1. A. J. Schell-Sorokin and R. M. Tromp, Phys. Rev. Lett. 64, 1039 (1990).
2. R. E. Martinez, W. M. Augustyniak, and J. A. Golovchenko, Phys. Rev. Lett. 64, 1035 (1990).
3. J. F. Geisz, T. F. Kuech, M. G. Lagally, F. Cardone, and R. M. Potemski, J. Appl. Phys. 75, 1530 (1994).
4. Hamamatsu PSD S3979.
5. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
6. W. A. Brantley, J. Appl. Phys. 44, 534 (1973).
7. U. von Hülsen, P. Thiyagarajan, and U. Geyer, Mater. Res. Soc. Symp. Proc. 441, 391 (1997).
8. U. Geyer, U. von Hülsen, and P. Thiyagarajan, Appl. Phys. Lett. 70, 1691 (1997).
9. R. Kirchheim, Prog. Mater. Sci. 32, 261 (1988).
10. U. Laudahn et al. (unpublished).