Ion beam source for soft-landing deposition

Review of Scientific Instruments

Volumn 69, Issue 1-2, 1998, Pages 485-495

  Biesecker, J P ^a,c   Ellison, G B ^a   Wang, H ^b,d   Iedema, M J ^b   Tsekouras, A A ^b   Cowin, J P ^b  

^a UNIVERSITY OF COLORADO   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^c Quantum Peripherals Colorado Inc   (United States)

^d SEAGATE TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTRON BEAMS; ION BEAMS; LENSES; MASS SPECTROMETERS; NUMERICAL METHODS; PLASMA SOURCES; PROBES; SPECTROSCOPY; TEMPERATURE PROGRAMMED DESORPTION;

SURFACE SPECTROSCOPIC PROBES; VIBRATIONAL SPECTROSCOPY;

ION SOURCES;

EID: 0032003021     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148459     Document Type: Article

References (32)

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23. Very oddly, the source in Ref. 14 does not (I have inspected it first hand) have magnetic suppression of electrons. I can only speculate that a magnetized structural component or filament heater stray field is doing the job for them!
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29. + emitters which had up to 10 eV of energy width, which we suspect was due to high resistivity in a flawed source, and can be a problem in any of the the sources if it is run at too low a temperature.
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