Correlation of stress-induced leakage current with generated positive trapped charges for ultrathin gate oxide

IEEE Transactions on Electron Devices

Volumn 45, Issue 2, 1998, Pages 567-570

  Lin, Yung Hao ^a   Lee, Chung Len ^a   Lei, Tan Fu ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; GATES (TRANSISTOR); LEAKAGE CURRENTS; ULTRATHIN FILMS;

STRESS INDUCED LEAKAGE CURRENTS (SILC); ULTRATHIN GATE OXIDES;

MOSFET DEVICES;

EID: 0032001719     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.658697     Document Type: Article

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