A study on the preparation conditions of single oriented (002) Hf film on n-(001) Si

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 2, 1998, Pages 643-648

  Shinkai, Satoko ^a   Yanagisawa, Hideto ^a   Sasaki, Katsutaka ^a   Abe, Yoshio ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cross sectional transmission electron microscopy (XTEM); Lattice mismatch; Magnetron sputtering; Single oriented (002) Hf film; X ray diffraction (XRD); X ray photoelectron spectroscopy (XPS)

Indexed keywords

AMORPHOUS FILMS; CRYSTAL LATTICES; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; ELECTROMIGRATION; FILM GROWTH; FILM PREPARATION; HAFNIUM; MAGNETRON SPUTTERING; SEMICONDUCTING SILICON; SEMICONDUCTOR SUPERLATTICES; SUBSTRATES;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM); LATTICE MISMATCH;

SEMICONDUCTING FILMS;

EID: 0032001212     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.643     Document Type: Article

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