Controlled nitrogen incorporation at Si-SiO2 interfaces by remote plasma-assisted processing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 2, 1998, Pages 709-714

  Koh, Kwangok ^a   Niimi, Hiro ^a   Lucovsky, Gerald ^a   Green, Martin L ^b  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

Auger electron spectroscopy; Chemical reaction pathways; Low temperature processing; Optical second harmonic generation; Plasma assisted oxidation and nitridation; Rapid thermal annealing; Si SiO2 interfaces

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; NITRIDING; NITROGEN; OXIDATION; PLASMA APPLICATIONS; REACTION KINETICS; SECOND HARMONIC GENERATION; SEMICONDUCTING SILICON; SILICA;

PLASMA ASSISTED OXIDATION/NITRIDATION;

INTERFACES (MATERIALS);

EID: 0032001146     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.709     Document Type: Article

References (14)

1. N. S. Saks, D. I. Ma and W. B. Fowler: Appl. Phys. Lett. 67 (1995) 374.
2. M. L. Green, D. Brasen, K. W. Evans-Lutterodt, L. C. Feldman, K. Krisch, W. Lennard, L. Manchanda, H.-T. Tang and M.-T. Tang: Appl. Phys. Lett. 65 (1994) 848.
3. K. L. Han, D. Wristers, T. S. Chen, C. Lin, K. Chen, J. Fulford and D. L. Kwong: 1995 SDDM PC 1-2 (1995) p. 261.
4. D. R. Lee, G. Lucovsky, M. R. Denker and C. Magee: J. Vac. Sci. Technol. A 13 (1995) 607.
5. D. R. Lee, C. Parker, J. R. Hauser and G. Lucovsky: J. Vac. Sci. Technol. B 13 (1995) 1778.
6. C. H. Bjorkman, C. E. Shearon, Jr., Y. Ma, T. Yasuda, G. Lucovsky, U. Emmerichs, C. Meyer, K. Leo and H. Kurz: J. Vac. Sci. Technol. A 11 (1993) 964.
7. U. Emmerichs, C. Meyer, H. J. Bakker, F. Wolter, H. Kurz, G. Lucovsky, C. Bjorkman, T. Yasuda, Yi Ma, Z. Jing and J. L. Whitten: J. Vac. Sci. Technol. B 12 (1994) 2484.
8. C. Meyer, G. Lüpke, U. Emmerichs, F. Wolter, H. Kurz, C. H. Bjorkman and G. Lucovsky: Phys. Rev. Lett. 74 (1995) 3001.
9. T. Yasuda, Y. Ma, S. Habermehl and G. Lucovsky: Appl. Phys. Lett. 60 (1992) 434.
10. G. Lucovsky: to be published in J. Vac. Sci. Technol. B 15 (1997).
11. D. V. Tsu, G. N. Parsons, G. Lucovsky and M. W. Watkins: J. Vac. Sci. Technol. A 7 (1989) 1115.
12. F A. Cotton and G. Wilkinson: Advanced Inorganic Chemistry (Interscience, New York, 1972) 3rd ed.
13. J. T. Fitch, C. H. Bjorkman, G. Lucovsky, F. H. Pollak and X. Yin: J. Vac. Sci. Technol. B 7 (1989) 775.
14. E. A. Irene: private communication.