메뉴 건너뛰기




Volumn 165, Issue 2, 1998, Pages 367-376

The behavior of radiation damage of Nb+ ion implanted sapphire after annealing at reducing atmosphere

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ORIENTATION; DENSITY (OPTICAL); ION IMPLANTATION; LIGHT ABSORPTION; NIOBIUM COMPOUNDS; RADIATION DAMAGE; SINGLE CRYSTALS;

EID: 0032000741     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199802)165:2<367::AID-PSSA367>3.0.CO;2-C     Document Type: Article
Times cited : (10)

References (19)
  • 2
    • 0041399653 scopus 로고
    • W. A. SIBLEY, Nucl. Instrum. and Methods B1, 419 (1984); B32, 194 (1988).
    • (1988) Nucl. Instrum. and Methods , vol.B32 , pp. 194


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.