In situ spectroscopic ellipsometry for advanced process control in vertical furnaces

Thin Solid Films

Volumn 313-314, Issue , 1998, Pages 442-445

  Lehnert, W ^a   Berger, R ^b   Schneider, C ^a   Pfitzner, L ^a   Ryssel, H ^a,b   Stehle, J L ^c   Piel, J P ^c   Neumann, W ^c  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^c SOPRA   (France)

Author keywords

End point detection; High temperature refractive indices; In situ ellipsometry; Vertical furnace

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; INDUSTRIAL FURNACES; LIGHT POLARIZATION; LIGHT REFLECTION; OPTICAL MULTILAYERS; OPTIMIZATION; PHASE SHIFT; PROCESS CONTROL; REFRACTIVE INDEX; SENSORS; SPECTROPHOTOMETRY;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SPECTROSCOPIC ELLIPSOMETRY; VERTICAL FURNACES;

ELLIPSOMETRY;

EID: 0032000381     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00861-4     Document Type: Article

References (6)

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3. W.A. Levinson, How Good is Your Gauge?, Semiconductor International, October 1995, pp. 165-170.
4. C. Schneider, R. Berger, L. Pfitzner, H. Ryssel, In situ ellipsometry for realtime feedback control of oxidation furnaces. Appl. Surf. Sci. 63 (1993) 135-142.
5. J.-P. Piel, J.-L. Stehle, O. Thomas, The fastest spectroscopic ellipsometry: applications and limitations for in situ and quality control. Thin Solid Films 233 (1993) 301-306.
6. D. Zahorski, J.L. Mariani, L. Escadafals, J. Gilles, Spectroscopic ellipsometry: a new tool for on-line quality control. Thin Solid Films 233 (1993) 412-415.