Fast-feedback iron contamination monitoring using surface photovoltage measurements

Journal of the Electrochemical Society

Volumn 145, Issue 2, 1998, Pages 701-706

  Cacciato, A ^a   Vleeshouwers, S ^a   Evseev, S ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BORON; CONTAMINATION; DIFFUSION IN SOLIDS; ELECTRIC CONDUCTIVITY OF SOLIDS; ION IMPLANTATION; IRON; SEMICONDUCTOR DOPING; SURFACE MEASUREMENT;

RAPID THERMAL PROCESSING (RTP); SURFACE PHOTOVOLTAGE MEASUREMENT;

SILICON WAFERS;

EID: 0031999955     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838326     Document Type: Article

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