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Volumn 313-314, Issue , 1998, Pages 102-107
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Application of the degree of polarization to film thickness gradients
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Author keywords
Bonded silicon on insulator (SiO2) on silicon (BOSI); Degree of polarization; Microspot spectroscopic ellipsometry; PCSA spectroscopic ellipsometry; Thickness gradient materials
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Indexed keywords
ELLIPSOMETRY;
LIGHT REFLECTION;
SEMICONDUCTING SILICON;
SILICON ON INSULATOR TECHNOLOGY;
SPECTROSCOPY;
POLARIZER COMPENSATOR SAMPLE ANALYZER (PCSA);
OPTICAL FILMS;
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EID: 0031997479
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(97)01005-5 Document Type: Article |
Times cited : (29)
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References (7)
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