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Volumn 313-314, Issue , 1998, Pages 102-107

Application of the degree of polarization to film thickness gradients

Author keywords

Bonded silicon on insulator (SiO2) on silicon (BOSI); Degree of polarization; Microspot spectroscopic ellipsometry; PCSA spectroscopic ellipsometry; Thickness gradient materials

Indexed keywords

ELLIPSOMETRY; LIGHT REFLECTION; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; SPECTROSCOPY;

EID: 0031997479     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01005-5     Document Type: Article
Times cited : (29)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.