High-efficiency drift-field thin-film silicon solar cells grown on electronically inactive substrates

Solar Energy Materials and Solar Cells

Volumn 51, Issue 1, 1998, Pages 95-104

  Zheng, G F ^a   Zhang, W ^b   Shi, Z ^b   Thorp, D ^a   Bergmann, R B ^c   Green, M A ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b Pacific Solar Pty Ltd   (Australia)

^c MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

Doping gradient; Drift field; Inactive substrate; Light trapping; Silicon; Thin film; Thinning

Indexed keywords

ALUMINUM; FILM GROWTH; LIQUID PHASE EPITAXY; SEMICONDUCTING GALLIUM; SEMICONDUCTING INDIUM; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; SUBSTRATES; THIN FILM DEVICES;

DRIFT FIELD; LIGHT TRAPPING;

SILICON SOLAR CELLS;

EID: 0031996648     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(97)00212-2     Document Type: Article

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