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Volumn 42, Issue 2, 1998, Pages 253-256

Schottky contacts on CF4/H2 reactive ion etched β-SiC

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DRY ETCHING; ELECTRIC CONTACTS; FLUORINE COMPOUNDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDATION; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031996193     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(97)00224-4     Document Type: Article
Times cited : (14)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.