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Volumn 42, Issue 2, 1998, Pages 253-256
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Schottky contacts on CF4/H2 reactive ion etched β-SiC
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
DRY ETCHING;
ELECTRIC CONTACTS;
FLUORINE COMPOUNDS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
OXIDATION;
REACTIVE ION ETCHING;
SCANNING ELECTRON MICROSCOPY;
SCHOTTKY BARRIER DIODES;
SEMICONDUCTOR DEVICE MANUFACTURE;
ETCHING SELECTIVITY;
SCHOTTKY CONTACTS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0031996193
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/S0038-1101(97)00224-4 Document Type: Article |
Times cited : (14)
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References (14)
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