Measuring and quantifying static charge in cleanrooms and process tools

Solid State Technology

Volumn 41, Issue 2, 1998, Pages 85-92

  Levit, Lawrence B ^a   Menear, Jack ^b  

^a Ion Systems   (United States)

^b Menear Associates   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEAN ROOMS; ELECTRIC CHARGE MEASUREMENT; ELECTRIC GROUNDING; ELECTRIC VARIABLES CONTROL; ELECTROSTATIC ACCELERATORS; IONIZATION; PRODUCTION CONTROL; STATIC ELECTRICITY;

STATIC CHARGE CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031988279     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (6)

1. R.P. Donovan, "Particles on Surfaces: Detection, Adhesion and Removal," in Particle Control for Semiconductor Manufacturing, Marcel Dekker Inc., New York, New York, p. 316, 1990.
2. B. Liu et al., "Particle Deposition on Semiconductor Wafers," Aerosol Science and Technology, Vol. 6, No. 3, pp. 215-224, 1987.
3. M. Yost et al., "Electrostatic Attraction and Particle Control," Microcontamination, pp. 18-23, June 1986.
4. Pathfinder Research On-line, an e-mail market research service provided by SEMI,Volume 6, Number 12, December 1996.
5. For a discussion of Poisson statistics, see Introduction to the Theory of Error, Y. Beers, Addison Wesley Publishing Co. Inc., pp. 7-23, 1957.
6. SEMI Standard #SEMI E14-93, "Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool."