Temperature dependence of the OH- absorption in SiO2 glass and melt to 1975 K

American Mineralogist

Volumn 83, Issue 3-4, 1998, Pages 331-338

  Grzechnik, Andrzej ^a,b   Mcmillan, Paul F ^a,b,c  

^a ARIZONA STATE UNIVERSITY   (United States)

^b UNIVERSITÉ DE LYON   (France)

^c INSTITUT UNIVERSITAIRE DE FRANCE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; HYDROGEN BONDS; SILICA;

AMBIENT CONDITIONS; BONDING ENVIRONMENT; FT-IR ABSORBANCE; HIGHEST TEMPERATURE; INCREASING TEMPERATURES; MOLAR EXTINCTION COEFFICIENT; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE;

TEMPERATURE DISTRIBUTION;

FTIR; SILICATE GLASS; SILICATE MELT; TEMPERATURE;

EID: 0031868002     PISSN: 0003004X     EISSN: None     Source Type: Journal    
DOI: 10.2138/am-1998-3-417     Document Type: Article

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