Electronic interaction between submonolayer molecular films and substrates of different nature

Annals of the New York Academy of Sciences

Volumn 852, Issue , 1998, Pages 330-338

  Wolf, H C ^a   Gomez U ^a   Port, H ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

METAL; SILICON DIOXIDE; SILVER;

CONFERENCE PAPER; DIPOLE; ELECTRON; ELECTRONICS; FLUORESCENCE; MOLECULAR INTERACTION; MOLECULE; SEMICONDUCTOR;

EID: 0031851135     PISSN: 00778923     EISSN: None     Source Type: Book Series    
DOI: 10.1111/j.1749-6632.1998.tb09882.x     Document Type: Conference Paper

References (17)

1. DREXHAGE, K.H. 1974. In Progress in Optics. E. Wolf, Ed. Vol. XII: 163-232. North-Holland. Amsterdam.
2. CHANCE, R.R., A. PROCK & R. SILBEY. 1978. Advan. Chem. Phys. 37: 1-64.
3. WALDECK, D.H., A.P. ALIVISATOS & C.B. HARRIS. 1985. Surf. Sci. 158: 103-125.
4. ALIVISATOS, A.P., M.F. ARNDT, S. EFRIMA, D.H. WALDECK & C.B. HARRIS. 1987. J. Chem. Phys. 86: 6540-6549.
5. DAFFERTSHOFER, M., H. PORT & H.C. WOLF. 1995. J. Lumin. 66-67: 208-212.
6. GRASER, F. & E. HÄDICKE. 1984. Liebigs Ann. Chem. 3: 483-494.
7. GÓMEZ, U., M. LEONHARDT, H. PORT & H.C. WOLF. 1997. Chem. Phys. Lett. 268: 1-6.
8. DAFFERTSHOFER, M., H. PORT & H.C. WOLF. 1995. Chem. Phys. 200: 225-233.
9. HOECHST AG. Frankfurt/Main, Germany.
10. KERN, W. 1993. Handbook of Semiconductor Wafer Cleaning Technology. Noyes Publ. Park Ridge, NJ.
11. PIETSCH, G.J. 1995. Appl. Phys. A 60: 347-363.
12. HAHN, P.O. & M. HENZLER. 1981. J. Appl. Phys. 52: 4122-4127.
13. PARKER, C.A. & W.T. REES. 1960. Analyst 85: 587-600.
14. CHANCE, R.R., A. PROCK & R. SILBEY. 1976. J. Chem. Phys. 65: 2527-2531.
15. PERSSON, B.N.J. & N.D. LANG. 1982. Phys. Rev. B 26: 5409-5415.
16. STAVOLA, M., D.L. DEXTER & R.S. KNOX. 1985. Phys. Rev. B 31: 2277-2289.
17. GÓMEZ, U., H. PORT ́ H.C. WOLF. To be published.