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Applied Surface Science

Volumn 123-124, Issue , 1998, Pages 76-81

Adsorption of Rb on Si(100)2 × 1 at room temperature studied with photoelectron spectroscopy

(3) Chao, Y C a,c Johansson, L S O b,d Uhrberg, R I G a

a LINKÖPING INSTITUTE OF TECHNOLOGY (Sweden)

b LUND UNIVERSITY (Sweden)

c Boston University (United States)

d TU DORTMUND UNIVERSITY (Germany)

Author keywords

Alkali metals; Chemisorption; Metal semiconductor interfaces; Silicon; Soft X ray photoelectron spectroscopy (using synchrotron radiation); Surface electronic phenomena

Indexed keywords

ADSORPTION; BINDING ENERGY; CHEMISORPTION; ELECTRON ENERGY LEVELS; LOW ENERGY ELECTRON DIFFRACTION; SATURATION (MATERIALS COMPOSITION); SEMICONDUCTING SILICON; SEMICONDUCTOR METAL BOUNDARIES; SURFACE PHENOMENA; SURFACE TREATMENT; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE RECONSTRUCTION;

RUBIDIUM;

EID: 0031710371 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)00479-0 Document Type: Article

Times cited : (5)

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