Drop in the infrared (λ = 9.2 μm) optical reflectance of Al thin films deposited on SiO2 glass substrate

Optik (Jena)

Volumn 108, Issue 1, 1998, Pages 4-7

  Villagomez, R ^a   Xiao, M ^a  

^a CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; FUSED SILICA; INFRARED RADIATION; LIGHT POLARIZATION; LIGHT REFLECTION; METALLIC FILMS; ULTRATHIN FILMS;

RED SHIFT; REFLECTION PEAK;

OPTICAL FILMS;

EID: 0031707274     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)