Application of electron cyclotron resonance chemical vapour deposition in the preparation of hydrogenated boron-doped Sic films

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 77, Issue 1, 1998, Pages 197-206

  Yoon, S F ^a   Ji, R ^a   Ahn, J ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; BORON; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRON CYCLOTRON RESONANCE; HYDROGENATION; PHOTOCONDUCTIVITY; RAMAN SCATTERING; SILICON CARBIDE;

MICROWAVE POWER;

OPTICAL FILMS;

EID: 0031704731     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/13642819808206393     Document Type: Article

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