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Volumn 493, Issue , 1998, Pages 9-14
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Important failure mechanism in MOCVD (Ba,Sr)TiO3 thin films: resistance degradation
a a a a a a a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
DEGRADATION;
ELECTRIC FIELD EFFECTS;
ELECTRIC RESISTANCE;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
THERMAL EFFECTS;
THIN FILMS;
RESISTANCE DEGRADATION;
FERROELECTRIC MATERIALS;
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EID: 0031701705
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (12)
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References (15)
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