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Volumn 493, Issue , 1998, Pages 9-14

Important failure mechanism in MOCVD (Ba,Sr)TiO3 thin films: resistance degradation

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; THERMAL EFFECTS; THIN FILMS;

EID: 0031701705     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (12)

References (15)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.