Demultiplexer with 120 channels and 0.29-nm channel spacing

IEEE Photonics Technology Letters

Volumn 10, Issue 1, 1998, Pages 90-92

  Sun, Z J ^b,c   McGreer, K A ^a,b,c   Broughton, J N ^d  

^a IEEE

^b TRLabs   (Canada)

^c UNIVERSITY OF MANITOBA   (Canada)

^d Alberta Microelectronic Centre   (Canada)

Author keywords

Demultiplexing; Gratings; Integrated optics; Spectrometry; Wavelength division multiplexing

Indexed keywords

DIFFRACTION GRATINGS; ETCHING; FREQUENCY DIVISION MULTIPLEXING; OPTICAL WAVEGUIDES; SILICA; SILICON WAFERS; SPECTROMETRY;

WAVELENGTH DIVISION MULTIPLEXING DEMULTIPLEXERS;

INTEGRATED OPTOELECTRONICS;

EID: 0031701025     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.651118     Document Type: Article

References (8)

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