Hall effect in Fe-Cr-Co alloy thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 1, 1998, Pages 151-156

  Chang, Hui Chen ^a   Chang, Yen Hwei ^a   Yao, Shyue Yen ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Extraordinary Hall effects; Hall coefficient; Hall effect; Hall resistivity; High resolution transmission electron microscope; Ion beam sputtering

Indexed keywords

ANNEALING; FERROMAGNETIC MATERIALS; HALL EFFECT; ION BEAMS; ION BOMBARDMENT; IRON ALLOYS; MAGNETORESISTANCE; METALLOGRAPHIC MICROSTRUCTURE; PARAMAGNETISM; PHASE SEPARATION; SPUTTER DEPOSITION; THIN FILMS;

HALL COEFFICIENTS; HALL RESISTIVITY; HALL VOLTAGE; ION BEAM SPUTTERING (IBS);

METALLIC FILMS;

EID: 0031699442     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.37.151     Document Type: Article

References (15)

1. D. J. Bergman and D. Stroud: Solid State Phys. 46 (1992) 147.
2. B. Hakansson and R. G. Ross: J. Appl. Phys. 68 (1990) 3285.
3. A. Mendiza-Galvan, G. Martinez and J. L. Martinez: Physica A 207 (1994) 365.
4. S. Kirkpatrick: Rev. Mod. Phys. 45 (1973) 574.
5. B. P. Watson and P. L. Leath: Phys. Rev. B 9 (1974) 4893.
6. J. Koplik: J. Phys. C 14 (1981) 4821.
7. M. Bartkowiak, G. D. Mahan, F. A. Modine and M. A. Alim: J. Appl. Phys. 79 (1996) 273.
8. M. Bartkowiak and G. D. Mahan: Phys. Rev. B 51 (1995) 10825.
9. D. Weaire and N. Rivier: Contemp. Phys. 25 (1984) 59.
10. T. Nagaya and Y. Ishibashi: Jpn. J. Appl. Phys. 36 (1997) 6136.
11. W. H. Press: Numerical Recipes in FORTRAN (Cambridge Univ. Press, Cambridge, 1993) 2nd ed.
12. J. Koplik, C. Lin and M. Vermette: J. Appl. Phys. 56 (1984) 3127.
13. N. A. Vrettos, H. Imakoma and M. Okazaki: J. Appl. Phys. 66 (1989) 2873.
14. N. A. Vrettos, H. Imakoma and M. Okazaki: J. Appl. Phys. 67 (1990) 3249.
15. M. Tanemura, H. Honda and A. Yoshida: J. Theor. Biol. 153 (1991) 287.