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Applied Surface Science

Volumn 123-124, Issue , 1998, Pages 219-222

Structural determination for H 2 O adsorption on Si(001)2 × 1 using scanned-energy mode photoelectron diffraction

(13) Franco, N a,b Chrost, J a,b Avila, J a,b Asensio, M C a,b,f Muller C c Dudzik, E c Patchett, A J c McGovern, I T c Giebel, T d Lindsay, R d Fritzsche, V d Bradshaw, A M d Woodruff, D P e

a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID (Spain)

b UNIVERSITÉ PARIS SACLAY (France)

c TRINITY COLLEGE DUBLIN (Ireland)

d FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT (Germany)

e UNIVERSITY OF WARWICK (United Kingdom)

f SYNCHROTRON SOLEIL (France)

Author keywords

Adsorption; Photoelectron diffraction; Semiconductor surfaces; Structure

Indexed keywords

ADSORPTION; CHEMICAL BONDS; CRYSTAL ORIENTATION; ELECTRON DIFFRACTION; MOLECULAR STRUCTURE; SURFACE PHENOMENA; SURFACE STRUCTURE; WATER;

SCANNED ENERGY MODE PHOTOELECTRON DIFFRACTION;

SEMICONDUCTING SILICON;

EID: 0031685888 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(97)00506-0 Document Type: Article

Times cited : (18)

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