Lifetime enhancement of a multicusp ion source for lithography

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 241-244

  Lee, Y ^a,b   Gough, R A ^a   Kunkel, W B ^a   Leung, K N ^a   Vujic, J ^a,b   Williams, M D ^a   Wutte, D ^a,c   Yang, F L ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Etcheverry Hall MCI 730   (United States)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC DISCHARGES; ION BEAM LITHOGRAPHY; IONS;

LIFETIME ENHANCEMENT;

ION SOURCES;

EID: 0031683277     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00055-0     Document Type: Article

References (8)

1. J. Orloff, Sci. Am. Oct. 96 (1991)
2. Y. Lee, L.T. Perkins, R.A. Gough. M. Hoffmann, W.B. Kunkel, K.N. Leung, M. Sarstedt, J. Vujic, M. Weber, and M.D. Williams, Nucl. Instrum. Methods Phys. Res. A 374, 1 (1996)
3. Y. Lee, R.A. Gough, W.B. Kunkel, K.N. Leung, L.T. Perkins, D.S. Pickard, L. Sun, J. Vujic, M.D. Williams, and D. Wutte, Nucl. Instrum. Methods Phys. Res. B
4. th International Conference on Ion Sources, Whistler, B.C., 10-16 Sept. Canada, 1995.
5. S. G. Zakhary, Rev. Sci. Instrum. 66, 5419 (1995).
6. J.K. Olthoff, R.J. Van Brunt, and S.B. Radovanov, Rev. Sci. Instrum. 67, 473 (1995).
7. Y. Lee, R.A. Gough, W.B. Kunkel, K.N. Leung, L.T. Perkins, D.S. Pickard, L. Sun, J. Vujic, M.D. Williams, and D. Wutte, Rev. Sci. Instrum. 68 (3), March 1997, 1398-1402
8. th International Conference on Ion Sources, Taormina, Italy, Sept. 7-13, 1997.