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Volumn 9, Issue 1-4, 1998, Pages 437-444

A new apparatus for ultra-high vacuum organic molecular beam deposition

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DEPOSITION; EQUIPMENT; FABRICATION; OPTICAL MATERIALS; VACUUM APPLICATIONS;

EID: 0031679060     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(97)00073-6     Document Type: Article
Times cited : (41)

References (19)
  • 14
    • 0000700689 scopus 로고    scopus 로고
    • and references therein
    • C.G. Wu, J.Y. Chen, Chem. Mater. 9 (1997) 399, and references therein.
    • (1997) Chem. Mater. , vol.9 , pp. 399
    • Wu, C.G.1    Chen, J.Y.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.