Formation of polysilane film by laser CVD

Thin Solid Films

Volumn 312, Issue 1-2, 1998, Pages 123-129

  Watanabe, Akira ^a   Kawato, Takashi ^a   Matsuda, Minoru ^a   Fujitsuka, Mamoru ^a   Ito, Osamu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition (CVD); Fluorescence; Laser CVD; Laser projection CVD; Micropatterning; Optical properties; Polysilane; Silane

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; ENERGY GAP; FLUORESCENCE; LASER APPLICATIONS; MASKS; MONOMERS; PHOTOLYSIS; POLYSILANES; X RAY PHOTOELECTRON SPECTROSCOPY;

DICHLOROMETHYL PHENYLSILANE; MOLECULAR ORBITAL THEORY; PHOTOMASKS;

SEMICONDUCTING FILMS;

EID: 0031678576     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00718-9     Document Type: Article

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