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Volumn 133, Issue 1-2, 1998, Pages 108-114

A study of the ionic route for hydrogen terminations resulting after SiO 2 etching by concentrated aqueous solutions of HF

Author keywords

Hydrogen termination; Ionic route; SiO 2 etching

Indexed keywords

CHARGE TRANSFER; ETCHING; HYDROFLUORIC ACID; HYDROGEN; SOLUTIONS; THERMOOXIDATION;

EID: 0031675969     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00182-2     Document Type: Article
Times cited : (13)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.