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Volumn 133, Issue 1-2, 1998, Pages 108-114
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A study of the ionic route for hydrogen terminations resulting after SiO 2 etching by concentrated aqueous solutions of HF
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Author keywords
Hydrogen termination; Ionic route; SiO 2 etching
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Indexed keywords
CHARGE TRANSFER;
ETCHING;
HYDROFLUORIC ACID;
HYDROGEN;
SOLUTIONS;
THERMOOXIDATION;
HYDROGEN TERMINATIONS;
SILICA;
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EID: 0031675969
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(98)00182-2 Document Type: Article |
Times cited : (13)
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References (22)
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