In situ investigation of the formation of an intermixed phase at the Ni/Si(100) interface by photoelectron spectroscopic methods

Applied Surface Science

Volumn 123-124, Issue , 1998, Pages 550-554

  Kilper, R ^a   Teichert, S ^b   Oelhafen, P ^a  

^a UNIVERSITY OF BASEL   (Switzerland)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; BAND STRUCTURE; NICKEL; PHOTOEMISSION; REACTION KINETICS; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

CORE LEVEL SPECTROSCOPY;

INTERFACES (MATERIALS);

EID: 0031674795     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00569-2     Document Type: Article

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