Mirage-effect-based depth profiling of micromachined silicon structures

Sensors and Actuators, A: Physical

Volumn 64, Issue 3, 1998, Pages 203-207

  Tuli, Suneet ^a   Bhattacharyya, Amalendu B ^a   Forget, Benoit C ^b   Fournier, Daniele ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

Depth profiling; Micromachining; Mirage effect; Silicon

Indexed keywords

NONDESTRUCTIVE EXAMINATION; SILICON; SPECTROSCOPIC ANALYSIS;

MIRAGE EFFECT BASED DEPTH PROFILING; PHOTOTHERMAL SPECTROSCOPY;

MICROMACHINING;

EID: 0031674002     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01623-3     Document Type: Article

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