Cross-sectional atomic force microscopy of focused ion beam milled devices

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1998, Pages 157-162

  Ebel, J ^a   Bozada, C ^a   Schlesinger, T ^a   Cerny, C ^a   DeSalvo, G ^a   Dettmer, R ^a   Gillespie, J ^a   Jenkins, T ^a   Nakano, K ^a   Pettiford, C ^a   Quach, T ^a   Sewell, J ^a   Via, G ^a   Welch, R ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FAILURE ANALYSIS; HETEROJUNCTION BIPOLAR TRANSISTORS; INSPECTION; ION BEAMS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM MILLED DEVICES;

SEMICONDUCTOR DEVICE TESTING;

EID: 0031653005     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/relphy.1998.670475     Document Type: Conference Paper

References (10)