Selective gold deposition via CVD onto self-assembled organic monolayers

Optical Materials

Volumn 9, Issue 1-4, 1998, Pages 406-410

  Käshammer, Josua ^a   Wohlfart, Peter ^a   Weiß, Jurij ^b   Winter, Carl ^b   Fischer, Roland ^b   Mittler Neher, Silvia ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COATINGS; DESORPTION; GOLD; MASS SPECTROMETRY; MONOLAYERS; ORGANOMETALLICS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACES;

DESORPTION TIME OF FLIGHT MASS SPECTROMETRY; ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION; SELF ASSEMBLED DITHIOLS; THIOLATED SURFACE; VOLATILE ORGANOMETALLIC MOLECULAR GOLD PRECURSOR;

ULTRATHIN FILMS;

EID: 0031652151     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-3467(97)00105-5     Document Type: Article

References (12)

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